Cooperative Research and Development Agreements and Semiconductor Technology: Issues Involving the âDOE-Intel CRADAâ (CRS Report for Congress)
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| Release Date |
Jan. 22, 1998 |
| Report Number |
98-81 |
| Report Type |
Report |
| Authors |
Wendy H. Schacht and Glenn J. McLoughlin, Science, Technology, and Medicine Division |
| Source Agency |
Congressional Research Service |
Summary:
In March 1997, a consortium of U.S. semiconductor companies (called the EUV LLC), led by Intel and including Motorola and Advanced Micro Devices, signed a cooperative research and development agreement (CRADA) with three Department of Energy laboratories to develop commercial applications for a semiconductor manufacturing technology called extreme ultraviolet (EUV) lithography. The promise of EUV technology is to allow semiconductor chip manufacturers to make chips with more computing speed and memory capacity.
